- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/30 - Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
Patent holdings for IPC class G03F 1/30
Total number of patents in this class: 47
10-year publication summary
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5
|
3
|
4
|
4
|
4
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6
|
3
|
4
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3
|
0
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| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
12 |
| Hoya Corporation | 2822 |
6 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
5 |
| Seagate Technology LLC | 4228 |
4 |
| Micron Technology, Inc. | 24960 |
3 |
| Dai Nippon Printing Co., Ltd. | 3891 |
3 |
| Samsung Display Co., Ltd. | 30585 |
2 |
| ASML Netherlands B.V. | 6816 |
2 |
| Samsung Electronics Co., Ltd. | 131630 |
1 |
| SK Hynix Inc. | 11030 |
1 |
| Synopsys, Inc. | 2829 |
1 |
| Boe Technology Group Co., Ltd. | 35384 |
1 |
| Beijing BOE Display Technology Co., Ltd. | 2497 |
1 |
| Newport Fab, LLC | 161 |
1 |
| Nissan Chemical Industries, Ltd. | 1822 |
1 |
| Shanghai Huali Microelectronics Corporation | 160 |
1 |
| Hitachi High-Tech Corporation | 4424 |
1 |
| Toppan Photomask Co., Ltd. | 56 |
1 |
| Other owners | 0 |